The deposition system consists of two vacuum chambers made by Mantis, which fulfil the conditions of high vacuum (HV). The first chamber enables the deposition of metal or metal oxide nanoparticles by means of the Inert Gas Condensation (IGC) method. The size of nanoparticles and its distribution are controlled by a suitable selection of process parameters, mainly with the use of a mass spectrometer placed in the processing chamber. It is possible to cover nanoparticles in situ with a thin layer of another metal or metal oxide, i.e. to develop core/shell nanoparticles. The other chamber is used for simultaneous or sequential sputtering of multicomponent thin layers and multilayers of metals and metal compounds of controlled chemical composition and thickness.

In both processing chambers, it is possible to monitor the temperature of the substrate (25–800°C), to impose substrate bias (0–600 V), and to adjust the substrate rotation (0−20 rpm). The deposition rate is monitored by a QCM (quartz crystal microbalance). Thin films are deposited on substrates of 2 inches in diameter, as well as smaller substrates of irregular shapes. The processing chambers are connected vacuum tight with a load-lock, which enables fast loading, as well as the storing and transfer of substrates between the chambers.


Working parameters

Thin films


base pressure 1·10-8 Torr

total pressure 1·10-2 - 1·10-4 Torr

controllable, constant Ar, N2, O2 flows

controllable, constant Ar, He, O2 flows

two DC magnetron sources and one RF magnetron source

Nanogen Trio – three DC magnetron sources

stabilized, constant input current (DC magnetron sources) and stabilized, constant input power (RF magnetron source)

stabilized, constant input current (DC magnetron source)

controllable substrate temperature (25 – 800 °C)

controllable sample bias (0 – 600 V) (DC)


controllable bias in aggregation zone (0-20 V) (DC)


aggregation zone cooled by liquid nitrogen


controllable nanoparticle size (1-20 nm) with the use of a mass spectrometer

variable speed sample rotation (0 – 20 rpm)

size of the substrate: 2’’ diameter wafers or not regular substrates with linear diameter up to 2’’

deposition rate is monitored by a QCM

Contact person

dr inż. Kamila Kollbek

Vacuum system
System for thin films deposition using magnetron sputtering